Tainan, Taiwan

Shang-Ju Hsieh

This inventor holds 2 USPTO granted patents. Top assignee: Chi Mei Corporation. Active years: 2019-2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shang-Ju Hsieh. Retrieved from https://idiyas.com/inventor/shang-ju-hsieh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2019-2021

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2 patents (USPTO):Explore Patents

Title: Innovations of Shang-Ju Hsieh

Introduction

Shang-Ju Hsieh is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of polymer chemistry and optical devices. With a total of 2 patents to his name, Hsieh continues to push the boundaries of innovation in his industry.

Latest Patents

Hsieh's latest patents include a polymethacrylate composition and an optical device made therefrom. The polymethacrylate composition consists of 50 to 85 parts by weight of methacrylate series polymer and 15 to 50 parts by weight of styrene series-maleic anhydride series copolymer, along with an aromatic compound having a phosphite group. The methacrylate series polymer has a weight average molecular weight (Mw) ranging from 20,000 to 200,000. Additionally, he has developed a resin composition for laser marking, which includes a resin and laser absorbers, showcasing his expertise in creating advanced materials for various applications.

Career Highlights

Shang-Ju Hsieh is currently associated with Chi Mei Corporation, where he applies his knowledge and skills to develop innovative products. His work has been instrumental in enhancing the performance and functionality of optical devices and materials used in laser marking.

Conclusion

Shang-Ju Hsieh's contributions to the field of polymer chemistry and optical devices highlight his role as a leading inventor. His innovative patents reflect his commitment to advancing technology and improving product performance.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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