Taipei, Taiwan

Shang-Ho Lin

This inventor holds 6 USPTO granted patents. Top assignee: Everlight USA, Inc.. Active years: 2001-2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shang-Ho Lin. Retrieved from https://idiyas.com/inventor/shang-ho-lin

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.4

ph-index = 2

Forward Citations = 17(Granted Patents)


Company Filing History:


Years Active: 2001-2002

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6 patents (USPTO):Explore Patents

Title: Innovator Spotlight: Shang-Ho Lin

Introduction: Shang-Ho Lin, an accomplished inventor based in Taipei, Taiwan, has made significant contributions to the field of technology and material science. With a total of six patents to his name, Lin has established himself as a key player in innovation within the industry.

Latest Patents: Among his notable achievements, Shang-Ho Lin's latest patents include advancements in photosensitive polymers and alicyclic compounds. These inventions are poised to impact various applications and are a testament to Lin's ingenuity and expertise in material development.

Career Highlights: Lin is currently employed at Everlight USA, Inc., where he continues to work on cutting-edge technologies. His career at this prestigious company has allowed him to further his research and develop innovative solutions that enhance product functionality and efficiency.

Collaborations: Throughout his career, Shang-Ho Lin has collaborated with talented colleagues, including Shang-Wern Chang and Yen-Cheng Li. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technology.

Conclusion: In summary, Shang-Ho Lin is a notable inventor whose work in photosensitive polymers and alicyclic compounds reflects his dedication to innovation. With his ongoing contributions at Everlight USA, Inc. and successful collaborations, he continues to make strides in the world of technology, showcasing the importance of inventive minds in shaping the future.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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