Shan-Fang Chen

Title: Innovations of Shan-Fang Chen

Introduction

Shan-Fang Chen is a notable inventor based in Taichung, Taiwan. He has made significant contributions to the field of technology, particularly in the development of advanced exposure apparatuses and methods for forming patterned layers. With a total of 3 patents to his name, Chen's work has had a considerable impact on the industry.

Latest Patents

Chen's latest patents include a "Method of forming patterned layer," a "Method of forming patterned photoresist layer," and an "Active device array substrate." The exposure apparatus he developed is designed to expose a photoresist layer on a substrate, creating multiple strip exposed patterns. This apparatus features a light source, a lens group, and a mask. The lens group consists of several strip lenses arranged parallel to one another, with overlapping regions defined as lens connecting regions. The mask contains shielding patterns that correspond to the strip exposed patterns, each with strip openings aligned parallel to the shielding patterns.

Career Highlights

Shan-Fang Chen is currently employed at AU Optronics Corporation, where he continues to innovate and contribute to the field. His work has been instrumental in advancing technologies related to photoresist layers and exposure methods.

Collaborations

Some of Chen's notable coworkers include Hsiang-Chih Hsiao and Ta-Wen Liao, who have collaborated with him on various projects within the company.

Conclusion

Shan-Fang Chen's contributions to technology through his patents and work at AU Optronics Corporation highlight his role as a significant inventor in the field. His innovative methods and apparatuses continue to influence advancements in the industry.