Shan-Chang Wang

Title: Innovations of Shan-Chang Wang

Introduction

Shan-Chang Wang is a notable inventor based in Taoyuan Hsien, Taiwan. He has made significant contributions to the field of chemical mechanical polishing technology. With a total of 3 patents to his name, Wang continues to push the boundaries of innovation in his industry.

Latest Patents

One of his latest patents is a "Chemical mechanical polishing apparatus having a measuring device for measuring a guide ring." This CMP apparatus features a polishing table, a wafer loading/unloading device, and a measuring device that automatically measures the severity of scoring on the guide ring. Another significant patent is a "Device used for detecting clamping force of processed object and method thereof." This device includes a detection unit and a pressure detection component that adjusts the clamping force by detecting variations in electric properties.

Career Highlights

Shan-Chang Wang is currently employed at Nan Ya Technology Corporation, where he applies his expertise in developing advanced polishing technologies. His work has been instrumental in enhancing the efficiency and effectiveness of chemical mechanical polishing processes.

Collaborations

Wang collaborates with talented coworkers, including Chih-Kun Chen and Ching-Huang Chen, to further innovate and refine their technologies.

Conclusion

Shan-Chang Wang's contributions to the field of chemical mechanical polishing are noteworthy. His innovative patents and collaborative efforts at Nan Ya Technology Corporation highlight his commitment to advancing technology in this area.