Hsinchu, Taiwan

Shan-An Liu

This inventor holds 1 USPTO granted patent. Top assignee: Mosel Vitelic Corporation. Active years: 2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shan-An Liu. Retrieved from https://idiyas.com/inventor/shan-an-liu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Shan-An Liu

Introduction

Shan-An Liu is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of chemical mechanical polishing, particularly in the semiconductor industry. His innovative approach aims to enhance the efficiency and accuracy of polishing processes for target wafers.

Latest Patents

Shan-An Liu holds a patent for a method that determines the chemical mechanical polishing time. This invention addresses the challenges of under-polishing and over-polishing by providing a systematic approach to calculate the optimal polishing time. The method involves polishing a control wafer to establish a relationship between polishing thickness and time, which is then applied to target wafers.

Career Highlights

Liu is associated with Mosel Vitelic Corporation, where he has been instrumental in advancing polishing technologies. His work has contributed to improving the quality and reliability of semiconductor manufacturing processes. With one patent to his name, he continues to be a valuable asset in his field.

Collaborations

Shan-An Liu has collaborated with notable colleagues, including Chun-Te Lin and Chung-Ru Wu. Their combined expertise has fostered innovation and development in their respective projects.

Conclusion

Shan-An Liu's contributions to the field of chemical mechanical polishing exemplify the importance of innovation in technology. His patent reflects a commitment to enhancing manufacturing processes in the semiconductor industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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