This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2015.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2015
Title: Shalina D Sudheeran: Innovator in Substrate Cleaning Technology
Introduction
Shalina D Sudheeran is a prominent inventor based in San Jose, CA (US). She has made significant contributions to the field of substrate cleaning technology. With a focus on innovative methods and apparatus, her work has the potential to impact various industries.
Latest Patents
Shalina holds 1 patent for her invention titled "Methods and apparatus for cleaning a substrate." This patent describes a substrate cleaning apparatus that includes a substrate support member, a liquid carbon dioxide source, a gaseous carbon dioxide source, and nozzles designed to discharge mixtures of solid and gaseous carbon dioxide. This innovative approach aims to effectively clean substrates, enhancing their performance and longevity.
Career Highlights
Shalina is currently employed at Applied Materials, Inc., where she continues to develop cutting-edge technologies. Her work at this leading company in the semiconductor and display industries showcases her commitment to advancing substrate cleaning methods.
Collaborations
Shalina has collaborated with notable colleagues, including James Matthew Holden and Song-Moon Suh. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.
Conclusion
Shalina D Sudheeran is a trailblazer in substrate cleaning technology, with her patent and work at Applied Materials, Inc. highlighting her contributions to the field. Her innovative spirit and collaborative efforts position her as a key figure in advancing cleaning methodologies.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile