Pune, India

Shailesh Fulse

This inventor holds 1 USPTO granted patent. Top assignee: Valmet Technologies Oy. Active years: 2025.


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Innovations of Shailesh Fulse in Filtration Technology

Introduction

Shailesh Fulse is an accomplished inventor based in Pune, India. He has made significant contributions to the field of filtration technology, particularly with his innovative designs that enhance efficiency and functionality. His work is recognized for its practical applications in various industries.

Latest Patents

Shailesh Fulse holds a patent for a Continuous Disc Filter Device. This device includes a slurry containing bath and a disc filter assembly that features a rotor assembly supported to turn on a horizontal axis. The design incorporates a filtrate outlet end, a plurality of filter discs spaced apart along the rotor assembly's horizontal axis, and multiple discharge conduits. Each disc filter section is equipped with a filtrate outlet, allowing for efficient filtration processes. The patent showcases his ability to create advanced solutions for complex filtration challenges.

Career Highlights

Shailesh Fulse is currently employed at Valmet Technologies Oy, where he continues to develop innovative filtration solutions. His expertise in engineering and design has led to advancements that benefit various industrial applications. His commitment to improving filtration technology is evident in his work and contributions to the field.

Collaborations

Shailesh collaborates with Tony Ingemar Borkenius, leveraging their combined expertise to drive innovation in filtration technology. Their partnership enhances the development of new solutions and improves existing technologies.

Conclusion

Shailesh Fulse's contributions to filtration technology through his patent and work at Valmet Technologies Oy highlight his role as a significant inventor in the industry. His innovative designs continue to influence the field and pave the way for future advancements.

Profile summary based on public USPTO records.
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