Rehovot, Israel

Shahar Seifer

This inventor holds 1 USPTO granted patent. Top assignee: Yeda Research and Development Co. Ltd. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shahar Seifer. Retrieved from https://idiyas.com/inventor/shahar-seifer-divugy9q

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Shahar Seifer: Inventor in Scanning Microscopy

Introduction

Shahar Seifer is an inventor based in Rehovot, Israel. His patent work concerns computational methods for extracting structural information from scanning microscope data. He is associated with Yeda Research and Development Co. Ltd.

Latest Patents

Seifer is credited with 1 patent: “System and Method for Extraction of Structural Data of a Sample from Scan Data.” The invention describes a computer system that processes measurements from a scanning microscope to produce a structural image of a sample.

The system analyzes data from multiple detection channels and compensates for image shifts caused by off-axis channels when sample features are out of focus. This parallax correction can help separate phase and depth information and extract a depth-contrast image from a single scan dataset.

Career Highlights

Seifer’s listed patent highlights work at the intersection of microscopy, image processing, and structural analysis. The disclosed approach aims to derive depth-related information from scan measurements while addressing distortions associated with the microscope’s detection geometry.

Collaborations

The provided information lists Michael Elbaum and Lothar Houben as Seifer’s coworkers. His patent is associated with Yeda Research and Development Co. Ltd.

Conclusion

Shahar Seifer’s patent focuses on improving the extraction of structural and depth information from scanning microscope data through computational parallax correction.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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