Shad Hedges

Title: Shad Hedges: Innovator in Photomask Cleaning Technology

Introduction

Shad Hedges is a notable inventor based in Meridian, ID (US). He has made significant contributions to the field of photomask technology, holding a total of 3 patents. His work focuses on innovative methods for cleaning photomasks, which are critical components in the semiconductor manufacturing process.

Latest Patents

One of Shad Hedges' latest patents is titled "Method and system for removal of contaminates from phaseshift photomasks." This invention describes a system and method to clean the pellicle frame and adhesive ring of a photomask reticle. One embodiment includes a cover that isolates the photomasks from the pellicle frame. The reticle is secured between a spin chuck and the cover, ensuring that the photomasks are isolated and protected from solvents used in the cleaning process. With the reticle secured to the spin chuck, the spin chuck is rotated under a pressurized spray of solvent. The solvent, which is caustic to the photomasks, effectively removes the contaminants from the adhesive ring. After the exposed areas are cleaned, the cover is removed, allowing foreign material from photomasks to be eliminated using less invasive solvents and methods.

Career Highlights

Shad Hedges is currently employed at Micron Technology Incorporated, where he continues to develop innovative solutions in the semiconductor industry. His expertise in photomask cleaning technology has positioned him as a valuable asset to his company.

Collaborations

Shad collaborates with his coworker, James Baugh, to further enhance the development of cleaning technologies for photomasks. Their combined efforts contribute to advancements in the semiconductor manufacturing process.

Conclusion

Shad Hedges is a dedicated inventor whose work in photomask cleaning technology has made a significant impact in the semiconductor industry. His innovative patents and collaborations continue to drive advancements in this critical field.