Hwaseong, South Korea

SeWoong Jung

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Asm IP Holding B.v.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: SeWoong Jung. Retrieved from https://idiyas.com/inventor/sewoong-jung

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 2.4

ph-index = 1


Company Filing History:


Years Active: 2025

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2 patents (USPTO):Explore Patents

Title: SeWoong Jung: Innovator in Substrate Processing Technology

Introduction

SeWoong Jung is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of substrate processing, particularly with his innovative methods that enhance manufacturing efficiency.

Latest Patents

SeWoong Jung holds a patent for a substrate processing method. This method involves filling a recess without voids or seams. It includes partially filling a trench with a first material on a substrate and supplying at least one constituent element included in the first material. Additionally, plasma is applied to induce fluidization of the first material. This innovative approach is crucial for improving the quality and reliability of substrate processing.

Career Highlights

SeWoong Jung is currently associated with ASM IP Holding B.V., a company known for its advanced semiconductor manufacturing equipment. His work at ASM IP Holding B.V. reflects his commitment to pushing the boundaries of technology in substrate processing.

Collaborations

SeWoong Jung collaborates with talented individuals such as TaeHee Yoo and JuHyuk Park. Their combined expertise contributes to the advancement of innovative solutions in their field.

Conclusion

SeWoong Jung's contributions to substrate processing technology exemplify the impact of innovation in manufacturing. His patent and ongoing work continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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