Seungryeol Oh

Title: Seungryeol Oh: Innovator in Semiconductor Measurement Technology

Introduction

Seungryeol Oh is a prominent inventor based in Suwon-si, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in measurement methods that enhance the manufacturing process.

Latest Patents

Seungryeol Oh holds a patent for a semiconductor device measurement method using X-ray scattering. This innovative method involves preparing a semiconductor device with a repeat structure, irradiating it with X-rays to obtain a first X-ray scattering image, and calculating a second X-ray scattering image through simulation. The second image corresponds to a target repeat structure for the semiconductor device. The process includes generating a repeat structure mask by analyzing the position of a signal for a regular repeat structure from the second X-ray scattering image, removing the mask from the first image, and generating an error image. Finally, the error image is analyzed to calculate irregularities in the repeat structure of the semiconductor device.

Career Highlights

Seungryeol Oh is currently employed at Samsung Electronics Co., Ltd., where he continues to develop and refine his innovative techniques in semiconductor measurement. His work has been instrumental in advancing the efficiency and accuracy of semiconductor manufacturing processes.

Collaborations

Seungryeol Oh collaborates with notable colleagues, including Jaeyong Lee and Hidong Kwak. Their combined expertise contributes to the ongoing advancements in semiconductor technology at Samsung Electronics.

Conclusion

Seungryeol Oh's contributions to semiconductor measurement methods exemplify the innovative spirit of modern technology. His work not only enhances manufacturing processes but also sets a foundation for future advancements in the field.