Pyeongtaek, South Korea

Seungman Han

This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: Lms Co., Ltd.. Active years: 2023.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Seungman Han: Innovator in Near-Infrared Technology

Introduction

Seungman Han is a notable inventor based in Pyeongtaek-si, South Korea. He has made significant contributions to the field of optical technology, particularly through his innovative patents. His work focuses on enhancing the functionality and efficiency of near-infrared absorbing materials.

Latest Patents

Seungman Han holds 1 patent for his invention titled "Near-infrared ray absorbing article and method for manufacturing thereof, and optical filter and method for manufacturing thereof." This invention relates to a near-infrared absorbing article and an optical filter that utilizes the same. The near-infrared absorbing article comprises a glass substrate that includes a compressive stress layer of predetermined thickness. This design provides a thin profile while maintaining a certain level of strength, allowing it to be cut using a blade or laser.

Career Highlights

Seungman Han is currently associated with Lms Co., Ltd., where he continues to develop and refine his innovative ideas. His work has positioned him as a key player in the optical technology sector, contributing to advancements that benefit various applications.

Collaborations

Seungman Han has collaborated with talented individuals such as Jinyoung Chung and Seonho Yang. These partnerships have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Seungman Han's contributions to near-infrared technology exemplify the impact of innovative thinking in the field of optics. His patent and ongoing work at Lms Co., Ltd. highlight his commitment to advancing technology for practical applications.

Profile summary based on public USPTO records.
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