Suwon-si, South Korea

Seungkyu Lim

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seungkyu Lim. Retrieved from https://idiyas.com/inventor/seungkyu-lim-caeudgmx

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Seungkyu Lim: Innovator in Substrate Processing Technology

Introduction

Seungkyu Lim is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of substrate processing technology. His work is particularly recognized for its impact on the efficiency and effectiveness of manufacturing processes.

Latest Patents

Seungkyu Lim holds a patent titled "COVER WAFER AND METHOD OF CLEANING SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME." This innovation addresses critical challenges in the cleaning processes of substrate processing equipment, enhancing operational efficiency.

Career Highlights

Seungkyu Lim is currently employed at Samsung Electronics Ltd., a leading global technology company. His role at Samsung has allowed him to work on cutting-edge technologies and contribute to advancements in the electronics industry.

Collaborations

One of his notable collaborators is Nohsung Kwak, with whom he has worked closely on various projects. Their partnership has fostered innovation and development in their respective fields.

Conclusion

Seungkyu Lim's contributions to substrate processing technology and his patent innovations reflect his dedication to advancing the industry. His work at Samsung Electronics Ltd. continues to influence the future of technology in significant ways.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…