Suwon, South Korea

Seunghwan Jung

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seunghwan Jung. Retrieved from https://idiyas.com/inventor/seunghwan-jung-l94uxitp

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Seunghwan Jung: Innovator in Unmanned Aerial Vehicles

Introduction

Seunghwan Jung is a notable inventor based in Suwon, South Korea. He has made significant contributions to the field of unmanned aerial vehicles (UAVs). His innovative designs focus on enhancing the safety and efficiency of these advanced technologies.

Latest Patents

Seunghwan Jung holds a patent for an unmanned aerial vehicle comprising a safety guard. This invention features a rotor-blade that provides thrust through the generation of a main stream. The safety guard surrounds the rotor-blade and includes a guide member that stabilizes the flow field when the rotor-blade rotates. Additionally, it has a diffuser that generates a secondary flow to increase the overall flow rate.

Career Highlights

Seunghwan Jung is currently employed at Samsung Electronics Co., Ltd., a leading technology company known for its innovative products. His work at Samsung has allowed him to explore and develop cutting-edge technologies in the UAV sector.

Collaborations

Seunghwan has collaborated with talented coworkers such as Yonghun Kang and Junho Park. Their combined expertise contributes to the advancement of UAV technologies and innovations.

Conclusion

Seunghwan Jung's contributions to unmanned aerial vehicles demonstrate his commitment to innovation and safety in technology. His patent reflects a significant step forward in the design and functionality of UAVs.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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