Company Filing History:
Years Active: 2025-2026
Title: Seungbae Bang - Innovator in Garment Pattern Generation
Introduction
Seungbae Bang is a notable inventor based in Santa Clara, CA (US). He has made significant contributions to the field of garment design through his innovative patent. His work focuses on the intersection of technology and fashion, showcasing how image data can be transformed into practical garment patterns.
Latest Patents
Seungbae Bang holds a patent for "Garment pattern generation from image data." This patent outlines systems and methods for generating a flat garment pattern and/or 3D mesh representation of a garment from images depicting the garment laid flat or hung up. The system can obtain both front and back images of the garment, allowing for the generation of a front and back silhouette. This process includes segmenting the garment from the background and creating a parametric representation based on the silhouettes. The resulting 3D mesh garment representation can then be used to generate a flat sewing pattern if desired.
Career Highlights
Seungbae Bang is currently employed at Amazon Technologies, Inc., where he continues to innovate in the field of garment technology. His work has the potential to revolutionize how garments are designed and produced, making the process more efficient and accessible.
Collaborations
Seungbae has collaborated with talented individuals such as Vidya Narayanan and Yuxuan Mei. Their combined expertise contributes to the advancement of technology in garment design.
Conclusion
Seungbae Bang's innovative approach to garment pattern generation exemplifies the fusion of technology and fashion. His contributions are paving the way for future advancements in the industry.