The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 14, 2025
Filed:
Dec. 16, 2022
Amazon Technologies, Inc., Seattle, WA (US);
Vidya Narayanan, Palo Alto, CA (US);
Yuxuan Mei, Seattle, WA (US);
Seungbae Bang, Santa Clara, CA (US);
Sunil Sharadchandra Hadap, Dublin, CA (US);
Amazon Technologies, Inc., Seattle, WA (US);
Abstract
Systems and methods are provided for generating a flat garment pattern and/or 3D mesh representation of a garment from one or more images depicting the garment laid flat or hung up. A system may obtain both a front image depicting a front view of a garment and a back image depicting a back view of the garment. A front and back silhouette of the garment may then be generated, which may include segmenting the garment depiction from background image content. A parametric representation of the garment may then be generated based on the front and back silhouettes, which may be implemented by iteratively optimizing, using differentiable rendering techniques, a garment representation within a parametric garment space previously learned for the particular garment type. A 3D mesh garment representation may then be generated based on the parametric representation, from which a flat sewing pattern may subsequently be generated if desired.