Company Filing History:
Years Active: 2017-2025
Title: Innovations of Seung-Young Son in Substrate Etching
Introduction
Seung-Young Son is a notable inventor based in Santa Clara, CA, who has made significant contributions to the field of substrate etching. With a total of three patents to his name, he has developed innovative methods that enhance the efficiency and effectiveness of etching processes in semiconductor manufacturing.
Latest Patents
One of his latest patents is focused on an integrated cleaning process for substrate etching. This method involves removing etchant byproducts from an etch reactor and discharging a substrate from an electrostatic chuck. The process begins with etching one or more layers on a substrate that is electrostatically secured to an electrostatic chuck within the chamber of the etch reactor using a first plasma. This etching generates etchant byproducts. After the etching is complete, a second plasma is introduced into the chamber to trim the photoresist and remove a portion of the etchant byproduct. The substrate is then electrostatically discharged and removed from the chamber. This innovative approach allows for the insertion of a second substrate without the need for in-situ cleaning between the removal of the first substrate and the insertion of the second.
Career Highlights
Seung-Young Son is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work focuses on advancing etching technologies that are crucial for the production of integrated circuits. His contributions have been instrumental in improving the overall efficiency of semiconductor manufacturing processes.
Collaborations
Throughout his career, Seung-Young Son has collaborated with talented individuals such as Seul Ki Ahn and Yi Zhou. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.
Conclusion
Seung-Young Son's work in substrate etching exemplifies the importance of innovation in the semiconductor industry. His patents reflect a commitment to enhancing manufacturing processes, which ultimately contributes to the advancement of technology.