Yongin-si, South Korea

Seung Wook Kwon

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Display Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seung Wook Kwon. Retrieved from https://idiyas.com/inventor/seung-wook-kwon-4jq21fj9

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Seung Wook Kwon: Display Device Manufacturing Inventor

Introduction

Seung Wook Kwon is an inventor associated with Yongin-si, South Korea, and Samsung Display Co., Ltd. His patent work concerns a manufacturing method for display devices that uses protective layers during substrate processing.

Latest Patents

The provided information lists one patent for Kwon: “Method of Manufacturing Display Device Including First and Second Protective Layers.” The method involves forming a display panel and encapsulation layer on a substrate, then adding first and second protective layers. It also describes forming a film, removing the substrate’s opposite surface, and removing the film and protective layers in a specified sequence. This process is designed to protect the display structure during manufacturing. Kwon is credited with 1 patent.

Career Highlights

Kwon’s listed patent reflects work in display-device manufacturing and protective-layer processes. The provided information associates him with Samsung Display Co., Ltd., a company focused on display technologies.

Collaborations

Hyo Jeong Kwon is identified as Kwon’s coworker. The available information does not specify their roles or whether they collaborated on the listed patent.

Conclusion

Seung Wook Kwon’s recorded invention addresses protective-layer sequencing in display-device manufacturing, highlighting his contribution to display technology at Samsung Display Co., Ltd.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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