Osan, South Korea

Seung Won Yu

This inventor holds 1 USPTO granted patent. Top assignee: Ap Systems Inc.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seung Won Yu. Retrieved from https://idiyas.com/inventor/seung-won-yu-1284ia1e

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Seung Won Yu: Innovator in Thin Film Manufacturing Technology.

Introduction

Seung Won Yu is a prominent inventor based in Osan-si, South Korea. He has made significant contributions to the field of thin film manufacturing, showcasing his expertise through innovative patent developments. His work focuses on enhancing the efficiency and uniformity of thin films used in various applications.

Latest Patents

Seung Won Yu holds a patent for a thin film manufacturing apparatus. This apparatus includes a chamber with an inner process space for a substrate, a substrate support unit, a heat source unit, and a plasma generation unit. The design aims to improve the uniformity of the thin film formed on the substrate, making it a valuable advancement in manufacturing technology. He has 1 patent to his name.

Career Highlights

Yu is currently associated with Ap Systems Inc., where he continues to develop innovative solutions in thin film technology. His work has positioned him as a key figure in the industry, contributing to advancements that benefit various sectors.

Collaborations

He has collaborated with notable colleagues, including Byoung Il Lee and Chang Kyo Kim, to further enhance the capabilities of their projects and innovations.

Conclusion

Seung Won Yu's contributions to thin film manufacturing technology reflect his dedication to innovation and excellence. His patent and ongoing work at Ap Systems Inc. highlight his role as a leading inventor in this specialized field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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