Santa Clara, CA, United States of America

Seung Wan Kim

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Cornell University. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seung Wan Kim. Retrieved from https://idiyas.com/inventor/seung-wan-kim-3uid1c24

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Seung Wan Kim: Innovator in Graphene Technology

Introduction

Seung Wan Kim is a notable inventor based in Santa Clara, California. He has made significant contributions to the field of materials science, particularly in the development of graphene-based technologies. His work focuses on high-performance materials that have the potential to revolutionize various industries.

Latest Patents

Seung Wan Kim holds a patent for "Graphenic fibers, yarns, composites, and methods of making the same." This patent encompasses high-performance graphene fibers and yarns, including their components and precursors. The invention also details methods for manufacturing these advanced materials, which are expected to have a wide range of applications.

Career Highlights

Seung Wan Kim is affiliated with Cornell University, where he engages in cutting-edge research. His work at the university allows him to collaborate with other experts in the field and contribute to the advancement of graphene technology.

Collaborations

Some of his notable coworkers include Yong Lak Joo and Ling Fei. Their collaborative efforts enhance the research environment and foster innovation in the development of new materials.

Conclusion

Seung Wan Kim's contributions to graphene technology exemplify the potential of innovative materials in modern applications. His work continues to inspire advancements in the field and highlights the importance of research in driving technological progress.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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