Gwangju, South Korea

Seung Hwan Yeo

This inventor holds 1 USPTO granted patent. Top assignee: Cns Co., Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seung Hwan Yeo. Retrieved from https://idiyas.com/inventor/seung-hwan-yeo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Seung Hwan Yeo: Innovator in Moisture-Removing Goggles

Introduction

Seung Hwan Yeo is a notable inventor based in Gwangju, South Korea. He has made significant contributions to the field of eyewear technology, particularly with his innovative approach to moisture management in goggles.

Latest Patents

Yeo holds a patent for goggles capable of automatically removing internal moisture. This invention provides a solution for users by protecting their faces from external substances while ensuring that moisture inside the goggles is effectively managed. The goggles feature a frame part coupled along the edge of a lens part and a moisture removal part that is detachably attached to the frame. This moisture removal part automatically discharges moisture from inside the frame to the outside, enhancing user comfort and visibility.

Career Highlights

Seung Hwan Yeo is associated with Cns Co., Ltd., where he continues to develop innovative solutions in eyewear technology. His work reflects a commitment to improving user experience through practical inventions.

Collaborations

Yeo collaborates with talented individuals such as Man Seong Kwen and Se Eun Park, contributing to a dynamic team focused on advancing technology in their field.

Conclusion

Seung Hwan Yeo's innovative goggles represent a significant advancement in eyewear technology, showcasing his dedication to solving practical problems for users. His contributions are paving the way for future innovations in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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