Seung-Hwa Baek

Title: Innovations of Seung-Hwa Baek

Introduction

Seung-Hwa Baek is a notable inventor based in Incheon, South Korea. He has made significant contributions to the field of photolithography, with a focus on innovative mask designs and manufacturing methods. His work has led to the development of two patents that showcase his expertise and creativity.

Latest Patents

Baek's latest patents include a mask for photolithography and a method of manufacturing the same. This mask features a transparent substrate, a phase shift pattern designed to alter the phase of light, a dielectric layer on the transparent substrate, and a negative refractive-index meta material layer on the dielectric layer. These innovations are crucial for advancing photolithography techniques in various applications.

Career Highlights

Throughout his career, Seung-Hwa Baek has worked with prominent organizations such as Samsung Display Co., Ltd. and Yonsei University. His experience in these institutions has allowed him to refine his skills and contribute to cutting-edge research and development in the field of display technology.

Collaborations

Baek has collaborated with talented individuals, including Yong Hoon Son and Min Hyuck Kang. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Seung-Hwa Baek's contributions to the field of photolithography through his patents and collaborations highlight his role as a significant inventor. His work continues to influence advancements in technology and manufacturing processes.