The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2019
Filed:
Sep. 08, 2017
Applicants:
Samsung Display Co., Ltd., Yongin-si, Gyeonggi-do, KR;
Industry-academic Cooperation Foundation, Yonsei University, Seoul, KR;
Inventors:
Yong Son, Suwon-si, KR;
Min Kang, Seoul, KR;
Bong-Yeon Kim, Seoul, KR;
Hyun-Joo Lee, Seoul, KR;
Hyang-Shik Kong, Seongnam-si, KR;
Jin-Ho Ju, Seoul, KR;
Kyoung-Sik Kim, Seoul, KR;
Seung-Hwa Baek, Incheon, KR;
Assignees:
Samsung Display Co., Ltd., Yongin-si, KR;
Industry-Academic Cooperation Foundation, Yonsei University, Seoul, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/26 (2012.01); G03F 1/32 (2012.01); G03F 1/50 (2012.01);
U.S. Cl.
CPC ...
G03F 1/26 (2013.01); G03F 1/32 (2013.01); G03F 1/50 (2013.01);
Abstract
A mask for photolithography includes: a transparent substrate; a phase shift pattern on the transparent substrate and configured to change a phase of light; a dielectric layer on the transparent substrate; and a negative refractive-index meta material layer on the dielectric layer.