This inventor holds 2 USPTO granted patents. Top assignee: Lg Chem, Ltd. Active years: 2008-2011.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2008-2011
Title: Seung-Hun Eu: Innovator in Electroless Plating and EMI Shielding Materials
Introduction
Seung-Hun Eu is a notable inventor based in Daejeon, South Korea. He has made significant contributions to the field of materials science, particularly in the development of catalyst precursor compositions for electroless plating and electromagnetic interference (EMI) shielding materials. With a total of 2 patents, his work is paving the way for advancements in these technologies.
Latest Patents
Seung-Hun Eu's latest patents include a catalyst precursor composition for electroless plating and a preparation method for transparent electromagnetic interference shielding material using the same. The catalyst precursor composition comprises a reactive oligomer, a reactive monomer, a photoinitiator, a catalyst precursor for electroless plating, and a solvent. This innovative composition simplifies the preparation of EMI shielding materials by utilizing a UV curable resin that adheres well to the base material, thus eliminating the need for pre-treating the base material with a receptive layer before electroless plating.
Career Highlights
Seung-Hun Eu is currently associated with LG Chem, Ltd., a leading chemical company known for its innovative solutions in various sectors. His work at LG Chem has allowed him to focus on developing advanced materials that meet the growing demands of modern technology.
Collaborations
Seung-Hun Eu collaborates with Jang-Hoon Lee, contributing to the advancement of their shared research interests in materials science and engineering.
Conclusion
Seung-Hun Eu's contributions to the field of electroless plating and EMI shielding materials highlight his innovative spirit and dedication to advancing technology. His patents reflect a commitment to creating efficient and effective solutions in materials science.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
