Seung H Park

Title: **Innovative Contributions of Seung H Park in Semiconductor Technologies**

Introduction

Seung H Park is a prominent inventor located in Pleasanton, California. With an impressive portfolio of 13 patents, he has made significant contributions to the field of semiconductor technology. His latest inventions focus on advanced methods of etching silicon oxide and enhancing the efficiency of semiconductor devices.

Latest Patents

Two of Seung H Park's most recent patents demonstrate his innovative approach to materials processing. The first, titled **Differential Silicon Oxide Etch**, describes a method for etching exposed silicon oxide on patterned heterogeneous structures. This method utilizes a gas phase etch created from a remote plasma etch, where the remote plasma excites a fluorine-containing precursor. The resulting plasma effluents combine with water vapor, allowing for the selective etching of varying silicon oxide densities at different rates. This technology is vital for applications requiring precise material removal, such as in low-density silicon oxide layers.

The second patent, **Cleaning High Aspect Ratio Vias**, presents a method for removing an amorphous silicon/silicon oxide film stack from vias. This technique involves a combination of remote and local plasmas to effectively remove unwanted silicon oxide. By utilizing an inert species local plasma, the method ensures any residual carbon layer from photoresist is treated, which is essential for preparing the substrate for epitaxial single crystal silicon film growth. This advancement is particularly significant in the formation of 3D NAND devices, such as VNAND technology.

Career Highlights

Seung H Park currently works at Applied Materials, Inc., a renowned company in the semiconductor and materials engineering field. His expertise in materials processing and etching techniques has positioned him as an influential figure within the industry. His work in developing novel fabrication methods continues to impact the advancement of semiconductor technologies.

Collaborations

Throughout his career, Seung H Park has collaborated with several talented individuals, including colleagues Anchuan Wang and Nitin K Ingle. Their combined efforts in research and development have led to groundbreaking advancements in semiconductor fabrication processes, contributing to the overall innovation landscape in this highly competitive field.

Conclusion

Seung H Park’s innovative patents and contributions to semiconductor technology underscore the importance of continuous research and development in this domain. His work not only advances technical capabilities but also plays a crucial role in shaping the future of electronic devices. As he continues to collaborate with leading professionals in the field, there is no doubt that his inventions will further revolutionize the industry.