Ann Arbor, MI, United States of America

Seung H Lee

This inventor holds 1 USPTO granted patent. Top assignee: University of Michigan. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seung H Lee. Retrieved from https://idiyas.com/inventor/seung-h-lee-73yf5768

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Seung H Lee: Innovator in Welding Process Monitoring

Introduction

Seung H Lee is a notable inventor based in Ann Arbor, MI (US). He has made significant contributions to the field of welding technology. His innovative approach focuses on enhancing the quality and reliability of welding processes.

Latest Patents

Seung H Lee holds 1 patent for his invention titled "Monitoring of a Welding Process." This patent describes a method for monitoring a welding process by detecting a selected portion of the light spectrum of the plasma plume during fusion welding. The method involves using a photo detector to process the detected spectrum, comparing it with expected spectra to assess weld quality, and providing signals to adjust the welding process accordingly.

Career Highlights

Seung H Lee is affiliated with the University of Michigan, where he applies his expertise in welding technology. His work has contributed to advancements in the field, particularly in ensuring the integrity of welds through innovative monitoring techniques.

Collaborations

Seung H Lee collaborates with Jyoti Mazumder, a fellow researcher at the University of Michigan. Their partnership enhances the research and development of welding technologies.

Conclusion

Seung H Lee's contributions to welding process monitoring exemplify the importance of innovation in engineering. His work not only improves welding quality but also sets a foundation for future advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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