Cheongju, South Korea

Seul-Gi Lee

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seul-Gi Lee. Retrieved from https://idiyas.com/inventor/seul-gi-lee-ll0m07kf

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Seul-Gi Lee: Innovator in Plasma Technology

Introduction

Seul-Gi Lee is a prominent inventor based in Cheongju, South Korea. He has made significant contributions to the field of plasma technology, particularly through his innovative patent related to plasma monitoring systems.

Latest Patents

Seul-Gi Lee holds a patent for a "Plasma sensing device, plasma monitoring system and method of controlling plasma processes." This invention includes a plasma chamber that performs plasma processes, equipped with first and second plasma sensing devices and a controller. The sensing devices generate detection signals based on incident beams radiated from the monitoring plasma plane. The controller utilizes these signals to detect two-dimensional plasma distribution information and control the plasma processes accordingly. He has 1 patent to his name.

Career Highlights

Seul-Gi Lee is currently employed at Samsung Electronics Co., Ltd., where he continues to advance his research and development in plasma technology. His work has been instrumental in enhancing the efficiency and effectiveness of plasma processes in various applications.

Collaborations

Seul-Gi Lee collaborates with notable colleagues, including Hun-Yong Park and Won-Don Joo. Their combined expertise contributes to the innovative projects at Samsung Electronics.

Conclusion

Seul-Gi Lee is a key figure in the realm of plasma technology, with a focus on developing advanced monitoring systems. His contributions are paving the way for future innovations in this critical field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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