Viladecavalls, Spain

Sergi Civil Pauli

This inventor holds 1 USPTO granted patent. Top assignee: Fico Transpar, S.a.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sergi Civil Pauli. Retrieved from https://idiyas.com/inventor/sergi-civil-pauli

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Sergi Civil Pauli: Inventor of a Fluid Ejection System

Introduction

Sergi Civil Pauli is an inventor based in Viladecavalls, Spain. His work includes a patented fluid ejection system designed to direct cleaning fluid toward an optical surface. He is associated with Fico Transpar, S.A.

Latest Patents

The available information identifies one patent associated with Civil Pauli: “Fluid Ejection System for Ejecting a Cleaning Fluid Toward an Optical Surface.” The invention uses an electromagnetically operated valve to regulate fluid flow. A spring biases a plunger toward the closed position, while an electromagnetic drive moves it into the open position to allow fluid through the valve body. A nozzle at the outlet directs the cleaning fluid toward the optical surface. The design includes a coil and coil reel arranged around the plunger to generate the electromagnetic field that opens the valve. Civil Pauli is credited with 1 patent.

Career Highlights

Civil Pauli’s documented patent work focuses on fluid control and targeted cleaning for optical surfaces. The system combines an electromagnetic valve, a spring-biased plunger, and an outlet nozzle in a single fluid ejection arrangement.

Collaborations

Civil Pauli is associated with Fico Transpar, S.A. His listed coworker is Jose Luis Villarubia Guarino.

Conclusion

Sergi Civil Pauli’s patent describes a controlled fluid ejection system intended to clean optical surfaces, reflecting his documented contribution to practical fluid-control technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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