Sergey Kobelkov

Title: Innovations of Sergey Kobelkov in Layout Design Repair

Introduction

Sergey Kobelkov is a notable inventor based in Moscow, Russia. He has made significant contributions to the field of layout design repair, particularly through his innovative patent. His work focuses on enhancing the accuracy and efficiency of layout designs in semiconductor manufacturing.

Latest Patents

Sergey Kobelkov holds a patent for "Layout design defect repair using inverse lithography." This invention addresses techniques for repairing layout design defects after layout data have been processed by resolution enhancement techniques. The repair process identifies a re-correction region that consists of three portions: core, transition, and visible portions. An inverse lithography process is then applied to the core and transition portions while considering effects from the visible portion to create a modified re-correction region. The transition portion is processed based on its distance from the boundary with the core portion, ensuring that layout features near the boundary are adjusted more than those farther away.

Career Highlights

Sergey Kobelkov is associated with Mentor Graphics Corporation, where he applies his expertise in layout design and semiconductor technologies. His innovative approach has contributed to advancements in the field, making him a valuable asset to his company.

Collaborations

Sergey has collaborated with notable professionals in his field, including George P. Lippincott and Yuri Granik. These collaborations have further enriched his work and contributed to the development of innovative solutions in layout design.

Conclusion

Sergey Kobelkov's contributions to layout design repair through his patent demonstrate his commitment to innovation in the semiconductor industry. His work continues to influence the field and showcases the importance of advancements in technology.