Grenoble, France

Sergei Postnikov

This inventor holds 1 USPTO granted patent. Top assignee: Freescale Semiconductor,inc.. Active years: 2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sergei Postnikov. Retrieved from https://idiyas.com/inventor/sergei-postnikov-py71nooc

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Sergei Postnikov

Introduction

Sergei Postnikov is a notable inventor based in Grenoble, France. He has made significant contributions to the field of semiconductor technology. His work focuses on methods that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Sergei holds a patent for a method of patterning a layer using a pellicle. This innovative method involves forming a layer on a semiconductor substrate and exposing it to light. The light travels through a second pellicle, which is manufactured by determining the transmission of light through a first pellicle. This process includes analyzing both normal and non-normal light transmissions to modify the first pellicle into a second pellicle.

Career Highlights

Sergei Postnikov is currently employed at Freescale Semiconductor, Inc., where he applies his expertise in semiconductor technologies. His work has led to advancements in the manufacturing processes that are crucial for the development of modern electronic devices.

Collaborations

Some of Sergei's coworkers include Kevin Dean Lucas and Kyle Patterson. Their collaborative efforts contribute to the innovative environment at Freescale Semiconductor, Inc.

Conclusion

Sergei Postnikov's contributions to semiconductor technology through his patent and work at Freescale Semiconductor, Inc. highlight his role as an influential inventor in the field. His innovative methods continue to shape the future of semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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