Pyeongtaek, South Korea

Seongsu Lee

This inventor holds 1 USPTO granted patent. Top assignee: Lms, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seongsu Lee. Retrieved from https://idiyas.com/inventor/seongsu-lee-2dkrmtqp

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Seongsu Lee: Innovator in Optical Film Technology

Introduction

Seongsu Lee is a notable inventor based in Pyeongtaek, South Korea. He has made significant contributions to the field of optical film technology. His innovative work has led to the development of a unique optical film that enhances various applications.

Latest Patents

Seongsu Lee holds a patent for an optical film that includes a base portion and a pyramid pattern layer. This layer features a plurality of pyramid patterns with a vertex angle ranging from 60° to 160°. Additionally, the optical film includes a diffusion layer with optical protrusion patterns. The pyramid pattern layer is designed to have a refractive index greater than or equal to that of the diffusion layer, with a haze value of the diffusion layer being 15% or higher. This invention showcases his expertise in creating advanced optical materials.

Career Highlights

Seongsu Lee is currently associated with Lms, Inc., where he continues to innovate and develop new technologies. His work at the company reflects his commitment to advancing optical film applications. With a focus on quality and performance, he has established himself as a key player in the industry.

Conclusion

Seongsu Lee's contributions to optical film technology demonstrate his innovative spirit and dedication to enhancing material performance. His patent reflects a significant advancement in the field, showcasing his expertise and commitment to innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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