Suwon, South Korea

Seongmin Oak

This inventor holds 1 USPTO granted patent and 1 published patent application and 1 EPO patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seongmin Oak. Retrieved from https://idiyas.com/inventor/seongmin-oak

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0


Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Seongmin Oak: Innovator in Garment Care Technology

Introduction

Seongmin Oak is a notable inventor based in Suwon, South Korea. He has made significant contributions to the field of garment care technology. His innovative approach has led to the development of a unique apparatus designed to enhance the care of garments.

Latest Patents

Seongmin Oak holds a patent for a garment care apparatus. This apparatus features a care chamber that includes two distinct areas. The first area accommodates garments of normal lengths, while the second area is designed for longer garments. The second bottom plane of the apparatus includes a drain outlet to discharge water, ensuring efficient garment care.

Career Highlights

Throughout his career, Seongmin Oak has worked with prominent companies, including Samsung Electronics Ltd. and Samsung Electronics Co., Ltd. His experience in these leading organizations has contributed to his expertise in innovation and technology.

Collaborations

Seongmin has collaborated with talented individuals such as Sangho Shin and Chulkie Park. These partnerships have fostered a creative environment that has led to advancements in garment care solutions.

Conclusion

Seongmin Oak's contributions to garment care technology exemplify his innovative spirit and dedication to improving everyday solutions. His patent and collaborations reflect his commitment to enhancing the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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