Taejon, South Korea

Seong-Yun Moon

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seong-Yun Moon. Retrieved from https://idiyas.com/inventor/seong-yun-moon

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: Seong-Yun Moon: Innovator in Photoresist Technology

Introduction

Seong-Yun Moon is a prominent inventor based in Taejeon, South Korea. He has made significant contributions to the field of photoresist technology, particularly through his work at Samsung Electronics Co., Ltd. His innovative approach has led to the development of a unique patent that enhances the capabilities of photoresist compositions.

Latest Patents

Seong-Yun Moon holds a patent for a positive working photoresist composition. This invention is crucial for advancements in semiconductor manufacturing and has implications for various applications in electronics.

Career Highlights

Throughout his career, Seong-Yun Moon has been associated with Samsung Electronics Co., Ltd., a leading company in the technology sector. His work has not only contributed to the company's success but has also positioned him as a key figure in the field of materials science.

Collaborations

Seong-Yun Moon has collaborated with notable colleagues, including Bong-Seok Moon and Chang-Ho Noh. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Seong-Yun Moon's contributions to photoresist technology exemplify the impact of innovative thinking in the electronics industry. His patent and collaborations highlight the importance of teamwork in driving technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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