Seong-Yong Moon

Title: Seong-Yong Moon: Innovator in Photomask Technology

Introduction

Seong-Yong Moon is a prominent inventor based in Yongin-si, South Korea. He has made significant contributions to the field of photomask technology, holding a total of 2 patents. His work focuses on enhancing the precision and efficiency of photomasks used in semiconductor manufacturing.

Latest Patents

Seong-Yong Moon's latest patents include innovative designs and methods that improve photomask functionality. One of his notable patents is for a photo-mask having an exposure blocking region and methods of designing and fabricating the same. This invention features a main mask pattern in a main region, a density correcting pattern in a peripheral region, and an exposure blocking pattern that prevents the density correcting pattern from being transcribed to a wafer. The design process involves providing a mask substrate with a mask layer and a photoresist layer, along with design data that specifies the main mask pattern. This data is used to derive exposure data that controls the exposure of the photoresist layer, ensuring high precision in the manufacturing process.

Another significant patent is a system and method for measuring the dimensions of patterns formed on photomasks. This system includes a light source that emits measuring light, a transmission detector for receiving this light, and a stage for placing the photomask. The controller utilizes a dimension-deciding algorithm to determine the dimensions of the circuit patterns based on the spectroscopic characteristics of the received measuring light.

Career Highlights

Seong-Yong Moon is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate in the field of semiconductor technology. His work has been instrumental in advancing the capabilities of photomasks, which are critical components in the production of integrated circuits.

Collaborations

Throughout his career, Seong-Yong Moon has collaborated with notable colleagues, including Seong-woon Choi and Il-Yong Jang. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies in the semiconductor industry.

Conclusion

Seong-Yong Moon's contributions to photomask technology exemplify his commitment to innovation and excellence in the semiconductor field. His patents reflect a deep understanding of the complexities involved in photomask design and measurement, positioning him as a key figure in advancing semiconductor manufacturing processes.