The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 06, 2008

Filed:

Jun. 13, 2005
Applicants:

Dong-gun Lee, Hwaseong-si, KR;

Seong-woon Choi, Suwon-si, KR;

Sang-yong Yu, Yongin-si, KR;

Seong-yong Moon, Yongin-si, KR;

Byung-gook Kim, Seoul, KR;

Inventors:

Dong-Gun Lee, Hwaseong-si, KR;

Seong-Woon Choi, Suwon-si, KR;

Sang-Yong Yu, Yongin-si, KR;

Seong-Yong Moon, Yongin-si, KR;

Byung-Gook Kim, Seoul, KR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A system for measuring dimension of photomasks comprises a light source emitting measuring light having a wavelength, a transmission detector for receiving the measuring light, a stage on which a photomask having circuit patterns is placed, the stage being disposed between the light source and the transmission detector, and a controller having a dimension-deciding algorithm to determine a dimension of the circuit patterns from a spectroscopic characteristic of the received measuring light, the controller being connected to the transmission detector.


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