Suwon-si, South Korea

Seong Ryeol Kim

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seong Ryeol Kim. Retrieved from https://idiyas.com/inventor/seong-ryeol-kim-k6nc0w9t

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Seong Ryeol Kim: Innovator in Process Proximity Effect Correction

Introduction

Seong Ryeol Kim is a prominent inventor based in Suwon-si, South Korea. He is known for his contributions to the field of process proximity effect correction, which plays a crucial role in improving the precision of pattern dispersion in various applications.

Latest Patents

Seong Ryeol Kim holds 1 patent for a "Process proximity effect correction method and process proximity effect correction device." This innovative method efficiently enhances the dispersion of patterns by utilizing a machine learning module executed by a processor. The process involves training a sensitivity model with layout images and critical dimensions of multiple patterns, estimating sensitivity prediction values, and determining correction rates for layout critical dimensions.

Career Highlights

Seong Ryeol Kim is currently employed at Samsung Electronics Ltd., where he applies his expertise in developing advanced technologies. His work significantly contributes to the company's reputation for innovation and excellence in the electronics industry.

Collaborations

He collaborates with notable colleagues, including Dae Young Park and Jeong Hoon Ko, who share his commitment to advancing technology in their respective fields.

Conclusion

Seong Ryeol Kim's innovative work in process proximity effect correction exemplifies the impact of dedicated inventors in the technology sector. His contributions continue to shape advancements in pattern dispersion and machine learning applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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