Daejeon, South Korea

Seong Jong Kim

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Korea Advanced Institute of Science and Technology. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seong Jong Kim. Retrieved from https://idiyas.com/inventor/seong-jong-kim-iiw0b1ts

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Seong Jong Kim and Advances in Polyamideimide Materials.

Introduction.

Seong Jong Kim is an inventor based in Daejeon, South Korea, and is associated with the Korea Advanced Institute of Science and Technology. His patent work concerns materials designed to combine thermal performance with optical clarity.

Latest Patents.

Kim is named on one patent, titled “Acid anhydride compound, and polyamideimide resin and film using the same.” The invention describes a novel acid anhydride compound and polyamideimide resin and film produced using it. According to the provided description, incorporating a structural unit derived from the compound may give the film high thermal resistance and a low coefficient of thermal expansion while preserving colorlessness and transparency. Kim’s listed patent count is 1 patent.

Career Highlights.

Kim’s listed affiliation is the Korea Advanced Institute of Science and Technology. His patent reflects research into polyamideimide materials and their potential combination of heat resistance, dimensional stability, and optical transparency.

Collaborations.

Sang Youl Kim is identified as Kim’s coworker and is associated with the patent collaboration information provided.

Conclusion.

Seong Jong Kim’s patent work focuses on a polyamideimide film designed to unite thermal resistance and low thermal expansion with colorless transparency.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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