Company Filing History:
Years Active: 2013
Title: Seong-Gyu Min: Innovator in Ultra-Low-Dielectric-Constant Films
Introduction
Seong-Gyu Min is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of semiconductor materials, particularly through his innovative production methods for ultra-low-dielectric-constant films. His work is crucial for advancing next-generation semiconductor technologies.
Latest Patents
Seong-Gyu Min holds a patent for a "Production method for an ultra-low-dielectric-constant film, and an ultra-low-dielectric-constant film produced thereby." This invention focuses on optimizing ratios in a mixed solution that consists of a poly (alkyl silsesquioxane) copolymer and a porogen. The mixed solution undergoes ultraviolet curing during heat treatment. The resulting ultra-low-dielectric-constant film can serve as an intermediate insulating film for next-generation semiconductors, offering a low dielectric constant ranging from 2.12 to 2.4, with uniformly distributed pores of 1 to 3 nm and a high degree of mechanical elasticity between 10.5 to 19 GPa.
Career Highlights
Seong-Gyu Min is affiliated with the Industry-University Cooperation Foundation at Sogang University. His role at this institution allows him to bridge the gap between academic research and practical applications in the semiconductor industry. His innovative work has positioned him as a key figure in the development of advanced materials.
Collaborations
Seong-Gyu Min has collaborated with notable colleagues, including Hee-Woo Rhee and Hyun Sang Choi. These partnerships have fostered a collaborative environment that enhances research and development efforts in their field.
Conclusion
Seong-Gyu Min's contributions to the field of ultra-low-dielectric-constant films are paving the way for advancements in semiconductor technology. His innovative methods and collaborative efforts continue to influence the industry positively.