Suwon-si, South Korea

Seong-Gil Park


Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2020

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1 patent (USPTO):

Title: The Innovations of Inventor Seong-Gil Park

Introduction

Seong-Gil Park, an influential inventor based in Suwon-si, South Korea, has made significant contributions to the field of semiconductor manufacturing. With a focus on innovative methods that enhance the efficiency and effectiveness of production processes, his work is recognized within leading technological circles.

Latest Patents

Seong-Gil Park holds a patent titled "Method of Manufacturing Metal Hardmask and Semiconductor Device." This innovative method involves several steps, including forming an etch target layer on a substrate, applying an amorphous metal layer that contains nitrogen between 15 atomic percentage (at %) and 25 at %, patterning the amorphous metal layer into an amorphous metal hardmask, and etching the etch target layer using the amorphous metal hardmask as an etching mask. This process not only streamlines semiconductor device manufacturing but also enhances the precision of the final products.

Career Highlights

Currently, Seong-Gil Park is associated with Samsung Electronics Co., Ltd., one of the world’s leading technology companies. His role in the organization underscores his expertise and commitment to advancing semiconductor technologies.

Collaborations

Throughout his career, Seong-Gil Park has collaborated with esteemed colleagues in his field, including Jang-Hee Lee and Se-Ran Oh. These partnerships reflect a collective effort to push the boundaries of innovation in semiconductor device manufacturing.

Conclusion

Seong-Gil Park's innovative methods and patented processes continue to make a significant impact in the semiconductor industry. His dedication to advancing technologies at Samsung Electronics Co., Ltd. highlights the importance of innovation in driving the future of electronics. As the industry evolves, contributions from inventors like Seong-Gil Park will undoubtedly shape the landscape of technology for years to come.

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