Seon Mee Cho

Title: Seon Mee Cho: Innovator in Barrier Layer Deposition Technology

Introduction

Seon Mee Cho is a prominent inventor based in Santa Clara, CA, known for his contributions to the field of semiconductor manufacturing. With a focus on barrier layer deposition techniques, he has made significant advancements that enhance the efficiency and effectiveness of the deposition process.

Latest Patents

Seon Mee Cho holds 2 patents related to barrier layer deposition using high-density plasma chemical vapor deposition (HDP-CVD). His latest patents detail methods for depositing a barrier layer on a substrate using a gaseous mixture that includes hydrocarbon-containing gases and silicon-containing gases. These methods involve generating plasma from the gaseous mixture to facilitate the deposition of films with precise thicknesses, contributing to the development of integrated stack structures with desirable dielectric properties.

Career Highlights

Seon Mee Cho is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work focuses on innovative techniques that improve the manufacturing processes of semiconductor devices. His expertise in barrier layer deposition has positioned him as a key player in advancing semiconductor technology.

Collaborations

Throughout his career, Seon Mee Cho has collaborated with notable colleagues, including Hichem M'Saad and Dana Tribula. These collaborations have fostered an environment of innovation and have contributed to the successful development of new technologies in the field.

Conclusion

Seon Mee Cho's contributions to barrier layer deposition technology exemplify his commitment to innovation in the semiconductor industry. His patents and work at Applied Materials, Inc. continue to influence advancements in semiconductor manufacturing processes.