Seongnam-si, South Korea

Seok Kyun Yoon

This inventor holds 1 USPTO granted patent. Top assignee: Seoul National University. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seok Kyun Yoon. Retrieved from https://idiyas.com/inventor/seok-kyun-yoon

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 9.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Seok Kyun Yoon: Innovator in Cosmetic Science

Introduction

Seok Kyun Yoon is a prominent inventor based in Seongnam-si, South Korea. He has made significant contributions to the field of cosmetic science, particularly through his innovative use of advanced materials.

Latest Patents

One of his notable patents is titled "Cosmetic Composition Containing Graphene Quantum Dots as Active Ingredient." This patent highlights his pioneering work in integrating graphene quantum dots into cosmetic formulations, which may enhance the efficacy and safety of cosmetic products.

Career Highlights

Seok Kyun Yoon is affiliated with Seoul National University, a prestigious institution known for its research and academic excellence. His work at the university has allowed him to explore cutting-edge technologies and their applications in cosmetics.

Collaborations

He has collaborated with esteemed colleagues, including Hyeon Ju Yeo and Yong Seok Choi, to further advance research in his field. These collaborations have fostered a dynamic environment for innovation and development.

Conclusion

Seok Kyun Yoon's contributions to cosmetic science through his patent and collaborations underscore his role as a leading inventor in the industry. His work continues to influence the future of cosmetic formulations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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