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For the Inventor, By the Inventor

Geneva, Switzerland

Senka Perc

This inventor holds 6 USPTO granted patents. Top assignee: Swatch Ag (Swatch Sa) (Swatch Ltd.). Active years: 2010-2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Senka Perc. Retrieved from https://idiyas.com/inventor/senka-perc

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 6

% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 4

Forward Citations = 61(Granted Patents)


Company Filing History:

goldMedal6 out of 83 
 
Swatch Ag (Swatch Sa) (Swatch Ltd.)
 patents

Years Active: 2010-2011

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6 patents (USPTO):Explore Patents
1. D635798 - Display unit (2011-04-12),
2. D634945 - Display unit (2011-03-29),
3. D634563 - Display unit (2011-03-22),
4. D632509 - Display unit (2011-02-15),
5. D632506 - Display unit (2011-02-15),
6. D616218 - Display unit (2010-05-25),

Title: Senka Perc: Innovator in Display Technology

Introduction

Senka Perc is a prominent inventor based in Geneva, Switzerland. She has made significant contributions to the field of display technology, holding a total of six patents. Her innovative work has garnered attention and respect within the industry.

Latest Patents

One of her latest patents is a display unit, which showcases her expertise in creating advanced visual technologies. This patent reflects her commitment to enhancing user experience through innovative design and functionality.

Career Highlights

Senka Perc is currently employed at Swatch AG, a well-known company in the watch and technology sector. Her role at Swatch AG allows her to apply her inventive skills in a dynamic environment, contributing to the development of cutting-edge products.

Conclusion

Senka Perc is a trailblazer in the realm of display technology, with a proven track record of innovation and a strong presence in the industry. Her work continues to inspire future advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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