Seng Keong Victor Lim

Title: Seng Keong Victor Lim: Innovator in Semiconductor Technology

Introduction

Seng Keong Victor Lim is a notable inventor based in Singapore, recognized for his contributions to semiconductor technology. He has developed innovative methods that enhance the performance of interconnect structures in electronic devices. His work is particularly significant in the field of metallization schemes.

Latest Patents

Seng Keong Victor Lim holds a patent for a method of fabricating an air gap metallization scheme that reduces inter-metal capacitance of interconnect structures. This method involves manufacturing a metallization scheme with an air gap formed by vaporizing a filler polymer material. The process begins with the formation of spaced conductive lines over a semiconductor structure, followed by the application of a filler material. The filler material is then etched back to expose the top surfaces of the conductive lines. A critical step involves forming a permeable dielectric layer over the filler material, which allows the vaporized filler material to diffuse and create a gap between the conductive lines. This innovative approach significantly improves the efficiency of interconnect structures.

Career Highlights

Seng Keong Victor Lim is associated with Chartered Semiconductor Manufacturing Ltd, where he has made significant contributions to the field of semiconductor manufacturing. His expertise in developing advanced metallization techniques has positioned him as a key figure in the industry.

Collaborations

Seng Keong Victor Lim has collaborated with notable colleagues such as Young-Way Teh and Ting-Cheong Ang. These collaborations have further enhanced the innovative work being done in semiconductor technology.

Conclusion

Seng Keong Victor Lim's contributions to semiconductor technology through his innovative patent demonstrate his commitment to advancing the field. His work continues to influence the development of more efficient electronic devices.