Sen Zhang

Title: Innovations of Sen Zhang in Variable Selective Etching Technology

Introduction

Sen Zhang is a notable inventor based in Chengdu, China. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent related to variable selective etching.

Latest Patents

Sen Zhang holds a patent for a new variable selective etching technology for thick Silicon-On-Insulator (SOI) devices. This technology involves a series of steps that enhance the etching process of SOI materials. The process includes providing an SOI wafer, depositing a composite hard mask with a variable selection ratio, applying a photoresist, and defining the to-be-etched region. The method further includes etching the photoresist, the composite hard mask, and subsequently etching the top silicon and buried oxide layer using different etching methods at specified selection ratios. This innovative approach avoids damage to the side walls of deep trenches during the etching of the buried oxide layer and eliminates the need for an excessively thick hard mask.

Career Highlights

Sen Zhang is affiliated with the University of Electronic Science and Technology of China, where he continues to advance his research and development in semiconductor technologies. His work has garnered attention for its practical applications in improving the manufacturing processes of SOI devices.

Collaborations

Sen Zhang collaborates with esteemed colleagues, including Bo Zhang and Teng Liu, who contribute to his research endeavors and innovations in the field.

Conclusion

Sen Zhang's contributions to variable selective etching technology represent a significant advancement in semiconductor manufacturing. His innovative methods not only improve efficiency but also enhance the quality of SOI devices.