Company Filing History:
Years Active: 2024
Title: Sen Mao Feng: Innovator in Semiconductor Technology
Introduction
Sen Mao Feng is a prominent inventor based in Fujian, China. He has made significant contributions to the field of semiconductor technology. His innovative approach has led to the development of a unique method for removing hard mask layers in semiconductor fabrication.
Latest Patents
Sen Mao Feng holds 1 patent for his invention titled "Method of removing hard mask layer." This method involves providing a gate that is covered by a hard mask layer. The process includes the use of two spacer structures that contact the sides of the gate. A wet etching process is then performed to effectively remove the hard mask layer and the first spacers while preserving the spacer structures. The etchant used in this process has a selective etching ratio of silicon nitride to silicon oxide greater than 90. The etchant includes Si(OH), with a concentration ranging from 3.95 ppm to 10 ppm.
Career Highlights
Sen Mao Feng is currently employed at United Semiconductor (Xiamen) Co., Ltd. His work at this company has allowed him to focus on advancing semiconductor technologies. His innovative methods have the potential to enhance the efficiency and effectiveness of semiconductor manufacturing processes.
Collaborations
Sen Mao Feng has collaborated with notable colleagues, including Ming Xuan Ren and Shih-Hsien Huang. These partnerships have contributed to the development of cutting-edge technologies in the semiconductor industry.
Conclusion
Sen Mao Feng is a key figure in the semiconductor field, with a focus on innovative methods for improving manufacturing processes. His contributions are paving the way for advancements in technology and efficiency in the industry.