Tokyo, Japan

Seki Akira

This inventor holds 1 USPTO granted patent and 2 EPO patents. Top assignee: Kawatetsu Mining Co., Ltd.. Active years: 1990.


% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 20(Granted Patents)


Company Filing History:


Years Active: 1990

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1 patent (USPTO):Explore Patents

Title: Seki Akira: Innovator in High Purity Silica Production

Introduction

Seki Akira is a notable inventor based in Tokyo, Japan. He is recognized for his significant contributions to the field of materials science, particularly in the production of high purity silica. His innovative approach has the potential to impact various industrial applications.

Latest Patents

Seki Akira holds a patent for a process aimed at producing high purity silica. This process effectively reduces impurities to less than 5 ppm from alkali silicate aqueous solutions, commonly known as water glass, which typically contains over 2000 ppm of impurities. The method involves directly adding water glass to a mineral acid solution, such as hydrochloric acid, nitric acid, or sulfuric acid, to dissolve impurities and form silica precipitate. The silica precipitate is then rinsed with a mineral acid solution, with the viscosity of the water glass adjusted to between 10-10000 poise prior to addition.

Career Highlights

Throughout his career, Seki Akira has worked with prominent companies, including Kawatetsu Mining Co., Ltd. and Nippon Steel Corporation. His experience in these organizations has contributed to his expertise in the field of silica production and materials science.

Collaborations

Seki Akira has collaborated with several professionals in his field, including Yuuki Narita and Shunroh Nagata. These collaborations have fostered innovation and advancements in silica production techniques.

Conclusion

Seki Akira's work in developing a process for producing high purity silica showcases his innovative spirit and dedication to advancing materials science. His contributions are likely to have lasting effects on industrial applications and the field as a whole.

Profile summary based on public USPTO records.
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