Haverford, PA, United States of America

Sekhar Sundaram

USPTO Granted Patents = 3 

 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Location History:

  • Merion Station, PA (US) (2016)
  • Haverford, PA (US) (2010 - 2017)

Company Filing History:


Years Active: 2010-2017

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3 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Sekhar Sundaram

Introduction

Sekhar Sundaram is a notable inventor based in Haverford, PA (US). He has made significant contributions to the field of polymer technology, holding a total of 3 patents. His work primarily focuses on developing advanced adhesive materials and layered structures.

Latest Patents

Sundaram's latest patents include innovative solutions in the realm of emulsion polymer adhesives. One of his inventions relates to multi-stage polymer emulsions that are suitable for forming pressure-sensitive adhesives with high peel and high-temperature cohesion. Another significant patent involves layered structures and articles prepared from these structures. This invention comprises at least two layers, with the first layer formed from a polyurethane composition and the second layer consisting of a functionalized polymer with specific molecular weight and melt index characteristics.

Career Highlights

Throughout his career, Sekhar Sundaram has worked with prominent companies in the chemical industry. He has been associated with Rohm and Haas Company and Dow Global Technologies LLC, where he contributed to various innovative projects and advancements in polymer technology.

Collaborations

Sundaram has collaborated with several professionals in his field, including Ralph Craig Even and Debkumar Bhattacharjee. These collaborations have further enriched his work and contributed to the development of his patented technologies.

Conclusion

Sekhar Sundaram's contributions to the field of polymer technology through his patents and collaborations highlight his innovative spirit and dedication to advancing adhesive materials. His work continues to influence the industry and pave the way for future innovations.

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