Kurume, Japan

Seiya Muta

This inventor holds 1 USPTO granted patent. Top assignee: Kurume University. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seiya Muta. Retrieved from https://idiyas.com/inventor/seiya-muta

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2023

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Seiya Muta: Innovator in Electroencephalographic Technology

Introduction

Seiya Muta is a notable inventor based in Kurume, Japan. He has made significant contributions to the field of electroencephalographic technology, particularly through his innovative patent.

Latest Patents

Muta holds a patent for a "Sensor connector apparatus for use in electroencephalographic spectrum analyzer." This apparatus is designed to connect an electroencephalographic spectrum analyzer with a sensor. It features conductive connection electrodes that link to sensor electrodes, enhancing the functionality of the electroencephalographic spectrum analyzer. The apparatus includes sensor connectors, each comprising a connector for the analyzer, a connector lead, and a conductive connector electrode linked to a sensor electrode.

Career Highlights

Seiya Muta is affiliated with Kurume University, where he continues to advance research in his field. His work has led to the development of technologies that improve the accuracy and efficiency of electroencephalographic analysis.

Collaborations

Muta has collaborated with notable colleagues, including Hideki Harada and Misa Ukeda. Their combined efforts contribute to the ongoing research and development in electroencephalographic technologies.

Conclusion

Seiya Muta's innovative work in sensor connector technology exemplifies the advancements being made in electroencephalographic analysis. His contributions are vital to the ongoing evolution of this important field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…