Tokyo, Japan

Seishiro Mochizuki

This inventor holds 1 USPTO granted patent. Top assignee: Nihon University. Active years: 2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seishiro Mochizuki. Retrieved from https://idiyas.com/inventor/seishiro-mochizuki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2008

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1 patent (USPTO):Explore Patents

Title: Seishiro Mochizuki: Innovator in Anti-Allergic Agents

Introduction

Seishiro Mochizuki is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of dermatology through his innovative work on anti-allergic agents and skin care products. His research focuses on developing solutions that alleviate various skin conditions.

Latest Patents

Mochizuki holds a patent for a formulation that includes anti-allergic agents, skin creams, dermatitis-blocking agents, pollinosis-alleviating agents, and bath agents. This invention aims to provide relief from itching and other skin irritations by utilizing natural products. The patent emphasizes the use of frass as a key ingredient, showcasing a unique approach to skin care.

Career Highlights

Seishiro Mochizuki is affiliated with Nihon University, where he continues to advance his research in dermatological innovations. His work has garnered attention for its potential to improve the quality of life for individuals suffering from skin allergies and related conditions.

Collaborations

Mochizuki collaborates with esteemed colleagues such as Toshinori Ishikawa and Toshihiro Akihisa. Their combined expertise enhances the research and development of effective skin care solutions.

Conclusion

Seishiro Mochizuki's contributions to the field of dermatology through his innovative patents highlight the importance of research in developing effective treatments for skin conditions. His work continues to inspire advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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