Fukuyama, Japan

Seishi Oda

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Mitsubishi Heavy Industries Limited. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seishi Oda. Retrieved from https://idiyas.com/inventor/seishi-oda

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Seishi Oda: Innovator in Line Sensor Technology

Introduction

Seishi Oda is a notable inventor based in Fukuyama, Japan. He has made significant contributions to the field of sensor technology, particularly with his innovative line sensor design. His work has implications for various industries, including printing and packaging.

Latest Patents

Oda holds a patent for a line sensor and printing press. This invention features a light source section that irradiates light of multiple colors to inspect objects. The light-receiving section detects the reflected light, utilizing a series of light-receiving sensors arranged in a row. The design includes two rows of light sources, with the light-receiving section positioned between them. The light sources are categorized into two groups based on color, with alternating disposition patterns to enhance functionality.

Career Highlights

Throughout his career, Seishi Oda has worked with prominent companies such as Mitsubishi Heavy Industries and Mitsubishi Heavy Industries Printing & Packaging Machinery. His experience in these organizations has allowed him to refine his skills and contribute to advancements in technology.

Collaborations

Oda has collaborated with notable colleagues, including Kazushi Okamoto and Masayasu Ogawa. These partnerships have fostered innovation and development in their respective fields.

Conclusion

Seishi Oda's contributions to line sensor technology exemplify his dedication to innovation. His patent and career achievements reflect his expertise and impact on the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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